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ID#:19362
Description:Caption:
Entitled, “NIOSH Looks at Worker Exposure to Silica Dust”, this image depicts a manager looking at products offered in a private dental laboratory, which participated in a NIOSH/National Institute of Public Health of Chile collaboration aimed at eliminating silicosis in the Americas. Industrial hygienists from both agencies, visited this lab in 2007, in order to evaluate worker exposures to crystalline silica dust during the manufacture of dental molds. With this picture, photographer Aaron Sussell, MPH CIH, with NIOSH, took Second Place in the 2008 CDC Connects Annual Public Health in Action Photo Contest, in the category of “International Programs”.
High Resolution: Click here for hi-resolution image (21.27 MB)
Content Providers(s):CDC/ CDC Connects
Creation Date:2007
Photo Credit:Aaron Sussell; Ph.D,, M.P.H., C.I.H., NIOSH
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Copyright Restrictions:None - This image is in the public domain and thus free of any copyright restrictions. As a matter of courtesy we request that the content provider be credited and notified in any public or private usage of this image.

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